Method for forming thin film heads using a tri-layer...

Stock material or miscellaneous articles – Magnetic recording component or stock – Magnetic head

Reexamination Certificate

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C428S212000, C428S213000, C428S469000, C427S404000, C427S419200, C427S419300, C427S419700, C427S419800

Reexamination Certificate

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07097923

ABSTRACT:
A tri-layer anti-reflective coating for use in photolithographic applications, and specifically, for use in ultraviolet photolithographic processes. The tri-layered anti-reflective coating is used to minimize pattern distortion due to reflections from neighboring features in the construction of microcircuits. The tri-layer anti-reflection coating features a first layer, a first dielectric layer, an absorption layer disposed on the first dielectric layer, and a second dielectric layer, which is then disposed between the absorption layer and a photoresist layer. At least the absorption layer and dielectric layers can be formed using vacuum deposition. A unique character of the tri-layer anti-reflective coatings is that it dampens reflections structures having severe topologies and also allows a thinner anti-reflection layer that has a wider process latitude.

REFERENCES:
patent: 4857373 (1989-08-01), Carcia et al.
patent: 5286608 (1994-02-01), Koh
patent: 5288558 (1994-02-01), Nothe
patent: 5314596 (1994-05-01), Shukovsky et al.
patent: 5368908 (1994-11-01), Ohta et al.
patent: 5759746 (1998-06-01), Azuma et al.
patent: 5926740 (1999-07-01), Forbes et al.
patent: 5963841 (1999-10-01), Karlsson et al.
patent: 5998100 (1999-12-01), Azuma et al.
patent: 6005277 (1999-12-01), Liu et al.
patent: 6010829 (2000-01-01), Rogers et al.
patent: 6037276 (2000-03-01), Lin et al.
patent: 6051369 (2000-04-01), Azuma et al.
patent: 6136679 (2000-10-01), Yu et al.
patent: 6156485 (2000-12-01), Tang et al.
patent: 6165855 (2000-12-01), Besser et al.
patent: 6200734 (2001-03-01), Blatchford, Jr. et al.
patent: 6274292 (2001-08-01), Holscher et al.
patent: 6282776 (2001-09-01), Otsuka et al.
patent: 6316167 (2001-11-01), Angelopoulos et al.
patent: 6323067 (2001-11-01), Ning
patent: 6346183 (2002-02-01), Baer et al.
patent: 6428894 (2002-08-01), Babich et al.
patent: 6501618 (2002-12-01), Kamijima et al.
patent: 6534425 (2003-03-01), Karr et al.
patent: 6751022 (2004-06-01), Phillips
patent: 6974766 (2005-12-01), Huang
patent: 2002/0195419 (2002-12-01), Pavelchek
patent: 2000-020915 (2000-01-01), None
patent: 2001-185531 (2001-07-01), None
patent: 2001-229513 (2001-08-01), None
JPO Abstract Translation of JP 2000-020915 (Patent Abstracts of Japan).
Derwent Abstract of JP 2001-185531-A (Derwent Acc. No. 2002-245715).
Machine Translation of JP 2001-185531-A.
Choi et al., “A Novel Anti-Reflective Structure for Metal Layer Patterning,” Proceedings of SPIE, vol. 333, Part 1, Feb. 23-25, 1998, pp. 336-346.
Lin et al., “Dual Layer Inorganic SiON Bottom ARC for 0.25 μm DUV Hard Mask Appliclations,” Proceedings of SPIE, vol. 3678, Mar. 1999, pp. 186-197.

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