Coating processes – Applying superposed diverse coating or coating a coated base – Synthetic resin coating
Reexamination Certificate
2005-07-12
2005-07-12
Meeks, Timothy (Department: 1762)
Coating processes
Applying superposed diverse coating or coating a coated base
Synthetic resin coating
C427S058000, C427S258000, C427S372200, C427S402000
Reexamination Certificate
active
06916506
ABSTRACT:
The invention provides thin films of low molecular compounds. A thin-film forming area on a surface of a silicon substrate is allowed to have high affinity for a thin-film forming material. For this purpose, a self-assembled film having an atomic group in common with a molecule constituting the thin-film forming material is formed in the thin-film forming area. Thereafter, a solution is discharged to the surface of the silicon substrate by an ink jet process.
REFERENCES:
patent: 5728431 (1998-03-01), Bergbreiter et al.
patent: 5885753 (1999-03-01), Crooks et al.
patent: 5900160 (1999-05-01), Whitesides et al.
patent: 1 028 136 (2000-02-01), None
patent: A 11-40358 (1999-02-01), None
patent: A 11-54272 (1999-02-01), None
patent: 11-054272 (1999-02-01), None
patent: WO 95/02251 (1995-01-01), None
patent: WO 99/26729 (1999-06-01), None
Definition of “pattern” from The American Heritage Dictionary of the English Language, 4th Edition,Copyright 2000 by Houghton Mifflin Company, as posted at http://www.bartleby.com/61/86/P01186000.html on Sep. 8, 2004.
A. Ulman, “An Introduction to Ultrathin Organic Film From Langmuir-Blodgett to Self-Assembly” Chapter 3, Academic Press, Inc., Boston, 1991.
Morii Katsuyuki
Takiguchi Hiroshi
Fletcher, III William Phillip
Meeks Timothy
Oliff & Berridg,e PLC
Seiko Epson Corporation
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