Method for forming thin film and method for fabricating...

Details Method for forming thin film and method for fabricating... Method for forming thin film and method for fabricating...

2006-03-14

2006-03-14

Nguyen, Ha Tran (Department: 2812)

Semiconductor device manufacturing: process

Electron emitter manufacture

C438S030000, C438S586000, C438S678000, C438S687000

Reexamination Certificate

active

07011981

ABSTRACT:
A method for forming a thin film and a method for fabricating a liquid crystal display device using the same are provided. The method provides a process that is simplified. Uniform thin film characteristics can be obtained. The method for forming a thin film includes the steps of forming a diffusion barrier film on a substrate, forming a metal seed layer on the diffusion barrier film, removing a metal oxide film formed on a surface of the metal seed layer using an electric plating method, and depositing metal on the metal seed layer in which the metal oxide film is removed.

REFERENCES:
patent: 6008065 (1999-12-01), Lee et al.
patent: 6297441 (2001-10-01), Macris
patent: 6403481 (2002-06-01), Matsuda et al.
patent: 2002/0000382 (2002-01-01), Morrissey et al.
patent: 1 005 078 (2000-05-01), None

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