Method for forming thin film and apparatus therefor

Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation

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427561, 427562, 427566, 427577, 427242, 427425, 118500, B05D 306, B05D 312, B05C 1300

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053208773

ABSTRACT:
In an apparatus for forming a thin film on substrates, two substrate supporters having respective recesses therein are connected by a shaft so that the recesses oppose one another, and opposing ends of many rod-like substrates are supported on the side walls of the recesses. Then, the substrates are rotated on the side walls as the substrate supporters are revolved, and the substrates shift their positions under their own weight. In this state, deposition particles impinge against the substrates from a material source, while the rod-like substrates are stirred so that each region of the outer peripheries thereof has an equal probability of having the film deposited thereon. Thus, a uniform thin film is formed on the surface of every substrate. The numbers of recesses may be two or more. Further, a nest of substrate supporters may be used.

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"Diamond Thin Films", C & E News, pp. 32-33 May 15, 1989.

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