Method for forming silica protective films

Details Method for forming silica protective films Method for forming silica protective films

1996-05-29

1999-06-22

Kiliman, Leszek

Coating processes

Magnetic base or coating

Magnetic coating

427129, 427130, 427131, 427255, 427387, 428694TP, 428900, G11B 566, B05D 512

Patent

active

059141514

ABSTRACT:
A coating film, which is constituted of a polysilazane, is formed on a substrate. The polysilazane in the coating film is then oxidized by being brought into contact with active oxygen or ozone, or by being exposed to light. A protective film, which is constituted of silica, is thereby formed on the substrate. An inorganic protective film is also provided, which comprises an inorganic oxide film, that is obtained by subjecting a polysilazane coating film to oxidation treatment, and fine particles contained in the inorganic oxide film.

REFERENCES:
patent: 4069360 (1978-01-01), Yanagisawa et al.
patent: 5316844 (1994-05-01), Suzuki et al.
patent: 5358739 (1994-10-01), Baney et al.
Derwert Publications, Ltd., London, GB; AN 86135222; XP002013924; JP-A-61 073 227 (NEC Corp) Apr. 15, 1986; *abstract.

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