Method for forming semiconductor structures using a calibrating

Details Method for forming semiconductor structures using a calibrating Method for forming semiconductor structures using a calibrating

1999-04-09

2000-10-10

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430 5, 356124, G03F 900

Patent

active

061300160

ABSTRACT:
A device and method to prepare a stepper to form semiconductor structure lines by using a calibration reticle to determine optimum numerical aperture and partial coherence values for the stepper. The calibration reticle includes a light-transmissive substrate having a plurality of patterns disposed thereon, each of the plurality of patterns including a series of structures of a constant size spaced an equal distance from one another and having a predetermined pitch intended to mimic a pitch value of a semiconductor structure reticle. The method includes positioning the calibration reticle on a stepper and optimizing the performance characteristics (e.g., the partial coherence value and the numerical aperture value) of the stepper using one of the patterns of the calibration reticle corresponding to a predetermined pitch of a semiconductor structure reticle.

REFERENCES:
patent: 5801821 (1998-09-01), Borodovsky

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