Etching a substrate: processes – Forming or treating optical article
Patent
1994-12-27
1996-08-27
Powell, William
Etching a substrate: processes
Forming or treating optical article
216 11, 216 39, 216 41, B44C 122, C03C 1500, B29C 3700
Patent
active
055492126
ABSTRACT:
First two or more layers are formed on the substrate, the layers having different etching rates such that the etching rates ascend from a bottom layer to a top layer. Second, a mask pattern is formed on the surface of the layers, the mask pattern comprising a plurality of islands each having a predetermined shape. Finally, isotropic etching is performed on the surface of the layers until a desired convex shape is formed on the surface of the layers. The desired convex shape on the surface of the layers is determined by the etching rate ratios of the layers. The etching rate of each layer is controlled by layer formation conditions such as a curing temperature for organic materials, and a flow rate ratio of source gases for inorganic materials.
REFERENCES:
patent: 3542453 (1970-11-01), Kantor
patent: 4610502 (1986-09-01), Nicia et al.
patent: 4610757 (1986-09-01), Khoe et al.
patent: 5004673 (1991-04-01), Vlannes
patent: 5389313 (1995-02-01), Imataki et al.
Koizumi, T. et al., "Reflective Multicolor LCD (II) : Improvement in the Brightness", Proceedings of the SID, vol. 29/2, 1988, pp. 157-160.
Kanoh Hiroshi
Mizobata Eishi
Nishida Shin-ichi
NEC Corporation
Powell William
LandOfFree
Method for forming rough surface with controlled convex shape does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for forming rough surface with controlled convex shape, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming rough surface with controlled convex shape will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1050533