Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1992-04-28
1994-07-19
Rosasco, Steve
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430322, 430326, G03F 900
Patent
active
053308620
ABSTRACT:
A method for forming a resist mask pattern by light exposure providing the steps of forming a resist layer on a semiconductor substrate, forming a phase shifter pattern for inverting a phase of exposed light in an upper portion of the resist layer itself or over the surface of the resist layer, exposing the surface of the semiconductor substrate including the phase shifter pattern, and forming a fine mask pattern below the edge of the phase shifter pattern.
REFERENCES:
patent: 5015559 (1992-01-01), Ogawa
Patent Abstracts of Japan vol. 16, No. 65 (P-1313) Feb. 18, 1992 & JP-A-3 259 257 (Mitsubishi Electric Corp.) Nov. 19, 1991.
Patent Abstracts of Japan vol. 16, No. 19 (P-1300) Jan. 17, 1992 & JP-A-3 237 458 (Mitsubishi Electric Corp.) Oct. 23, 1991.
Patent Abstracts of Japan vol. 5, No. 110 (P-71) Jul. 17, 1981 & JP A-56 051 738 (Oki Electric Inc. Co. Ltd.) May 9, 1981.
Patent Abstracts of Japan vol. 13, No. 268 (E-775) Jun. 20, 1989 & JP-A-1 059 884 (Fujitsu Ltd.) Mar. 7, 1989.
Iguchi Katsuji
Moriwaki Hiroyuki
Tabuchi Hiroki
Tanigawa Makoto
Taniguchi Takayuki
Rosasco Steve
Sharp Kabushiki Kaisha
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