Method for forming relief pattern

Gas separation: apparatus – Electric field separation apparatus – Electrode cleaner – apparatus part flusher – discharger – or...

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96 28, 96 351, 96 68, G03C 500, G03C 1112

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active

040024784

ABSTRACT:
A method for forming a relief pattern on a substrate which comprises the steps of: (I) allowing a photosensitive sheet to adhere on said substrate, said photosensitive sheet containing a photo-impervious ink layer, releasing layer, pattern forming layer and photosensitive resin layer; (II) radiating actinic rays on said photosensitive sheet to cure an irradiated portion of said photosensitive resin layer; (III) peeling off the upper layers of said photosensitive sheet; and (IV) washing away the un-cured portion of said photosensitive resin layer to produce a fine and decorative relief pattern.

REFERENCES:
patent: 2980533 (1961-04-01), Charlton
patent: 3060026 (1962-10-01), Heiart
patent: 3157505 (1964-11-01), Notley
patent: 3259499 (1966-07-01), Thommes
patent: 3313626 (1967-04-01), Whitney
patent: 3615435 (1971-10-01), Chu et al.
patent: 3652273 (1972-03-01), Htoo
patent: 3661576 (1972-05-01), Crary
patent: 3770438 (1973-11-01), Celeste
patent: 3826650 (1974-07-01), Schlesinger
patent: 3891441 (1975-06-01), Tsuji et al.

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