Method for forming polyimide film by chemical vapor deposition

Details Method for forming polyimide film by chemical vapor deposition Method for forming polyimide film by chemical vapor deposition

1987-07-23

1988-07-26

Childs, Sadie L.

Coating processes

Coating by vapor, gas, or smoke

Organic coating applied by vapor, gas, or smoke

427255, 4273855, C23C 1600

Patent

active

047599588

ABSTRACT:
A method for forming a polyimide film on a substrate surface by chemical vapor deposition comprises evaporating an aromatic monomer compound having one amino group and two adjacent carboxyl groups or its derivative group, such as esters of 4-amino phthalic acid, and 4-(p-anilino) phthalic acid, thus a high strength polyimide is obtained represented by the general formula having its imide groups being unidirectionally arranged in its backbone chain: ##STR1## wherein R is nil or divalent aliphatic or aromatic group and n is an integer.

REFERENCES:
patent: 4104438 (1978-08-01), Angelo et al.
patent: 4180614 (1979-12-01), Angelo et al.
patent: 4624867 (1986-11-01), Iijima et al.

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