Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1983-02-28
1984-08-14
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
136260, 136264, 136265, 204192P, 204298, C23C 1500, H01L 3118
Patent
active
044655754
ABSTRACT:
At least two constituent elements of a semiconductor compound are deposited in varying proportions by magnetron sputtering to produce a film having a preselected concentration gradient of the constituent elements. The film can be heat treated during or after deposition to diffuse the constituent elements within the film and enhance growth of a desired film structure. The sputtering step may be performed using a planar magnetron having a plurality of continuous magnetically enhanced sputtering cathodes extending about a common axis. Each of the cathodes includes a source structure containing at least one of the constituent elements, and provision for applying electrical power to the source structure to sputter the constituent element at a controlled rate. If one of the elements is difficult to control in the deposition process, it can be sputtered from a cathode made up of a stable alloy of the element and another constituent of the film. For example, when the semiconductor compound is CuInSe.sub.2, two of the sputtering cathodes may comprise In.sub.2 Se.sub.3 and Cu.sub.2 Se, respectively, and a third optimal cathode comprises either Cu or In.
REFERENCES:
patent: 4398055 (1983-08-01), Ijaz et al.
Choudary Uppala V.
Love Robert B.
Atlantic Richfield Company
Weisstuch Aaron
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