Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Patent
1997-10-24
1999-01-12
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
4302701, G03C 500
Patent
active
058585907
ABSTRACT:
A method for forming photoresist patterns by performing a photolithograpy process by the unit of a predetermined number of wafers, wherein the photoresist patterns are formed under a condition that an exposure time taken to fore each of the photoresist patterns is predetermined taking into consideration a variation in reflection factor, on the basis of the following equation:
REFERENCES:
patent: 5427878 (1995-06-01), Corliss
patent: 5437948 (1995-08-01), Minghetti et al.
Goo Young Mo
Hong Heung Gee
Kwon O Sung
Lee Doo Hee
Yook Hyung Sun
Chu John S.
Hyundai Electronics Industries Co,. Ltd.
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