Semiconductor device manufacturing: process – With measuring or testing
Reexamination Certificate
2005-04-05
2008-05-27
Geyer, Scott B. (Department: 2812)
Semiconductor device manufacturing: process
With measuring or testing
C438S011000, C438S016000, C257SE21023
Reexamination Certificate
active
07378289
ABSTRACT:
A photomask and a method for forming a photomask are disclosed in which die regions that define features for a process step of a semiconductor fabrication process are formed on a photomask and a test pattern for a different process step is formed in a blading area of the photomask. Also, a method for forming test structures is disclosed in which the photomask is exposed to transfer the test pattern to a semiconductor substrate. The process step that is associated with the test pattern is then performed, forming a test structure on the semiconductor substrate. By utilizing blading areas of photomasks and including test patterns for different process steps on the same photomask, more test structures can be obtained, without the need to generate additional photomasks for testing purposes.
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Choi Jeong
Hsueh Pauli
Huang Pao-Lu
Ma Zhijian
Geyer Scott B.
Glass Kenneth
Glass & Associates
Integrated Device Technology Inc.
Nikmanesh Seahvosh
LandOfFree
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