Method for forming phosphor layer on shadow mask of plasma...

Details Method for forming phosphor layer on shadow mask of plasma... Method for forming phosphor layer on shadow mask of plasma...

2004-12-07

2008-11-11

Mayekar, Kishor (Department: 1795)

Chemistry: electrical and wave energy

Processes and products

Electrophoresis or electro-osmosis processes and electrolyte...

C204S486000, C204S487000, C204S490000, C204S491000

Reexamination Certificate

active

07449094

ABSTRACT:
A method of forming a phosphor layer on a shadow mask of a plasma display panel (PDP) is described. The shadow mask is bonded with a deposition mask such that predetermined apertures on the former are aligned with the openings on the latter and the other apertures blocked by the latter. The two masks are loaded into an electrophoretic cell, where a kind of phosphor is attracted by the shadow mask to pass through the openings on the deposition mask and deposit on the internal walls of the exposed apertures of the shadow mask. The phosphor layer is then dried to remove the solvent. By repeating the above steps with different kinds of phosphor, deposition masks and electrophoretic cells, phosphor layers of three different colors can be formed on the shadow mask for fabricating a full-color PDP.

REFERENCES:
patent: 6627060 (2003-09-01), Yum et al.
patent: 2005/0218805 (2005-10-01), Kitagawa et al.
patent: 09-202995 (1997-08-01), None

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