Method for forming patterned transparent conducting film

Coating processes – Electrical product produced – Metallic compound coating

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427226, 427259, 427282, 427287, 427553, 427558, 427559, B05D 512

Patent

active

054036160

ABSTRACT:
Printing is conducted at the transparent conducting film unnecessary portion on a substrate 1 with a masking ink having a higher thermal decomposition temperature than that of the transparent conducting film forming composition, and the ink is dried and cured by heat or light to form a masking pattern 2. The portion where a transparent conducting film is to be formed is preferably subjected to ozone cleaning and then coated with a transparent conducting film forming composition comprising an indium compound and/or a tin compound and a solvent to form a transparent conducting film forming composition layer 3. The thus worked substrate is subjected to a heat treatment, causing thermal decomposition of the masking pattern 2 after formation of a transparent conducting film. Then the residues of the masking ink and the transparent conducting film are removed to finally obtain a desired patterned transparent conducting film 4.

REFERENCES:
patent: 4187340 (1980-02-01), Oishi et al.
patent: 4420500 (1983-12-01), Nakatani et al.
patent: 4789620 (1988-12-01), Sasaki et al.
patent: 4924800 (1990-12-01), Tanaka

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