Coating processes – Electrical product produced – Metallic compound coating
Patent
1987-07-01
1988-06-21
Bueker, Richard
Coating processes
Electrical product produced
Metallic compound coating
427226, 427272, 427282, B05D 512
Patent
active
047525010
ABSTRACT:
A method is disclosed for forming a semiconductor tin oxide thin film on a selected region of a surface without forming the film on an adjacent region. An ink film composed of tin(II) carboxylate compound is applied to the surface and heated to partially decompose the compound. A positive photoresist layer is preferably applied to the partially decomposed layer and selectively irradiated to define a mask overlying the selected region. Unwanted photoresist material is dissolved from the adjacent region using an aqueous alkaline solution. It is found that the solution concurrently dissolves the underlying partially decomposed tin compound, without dissolving the compound protected by the mask. Thereafter, the mask is stripped, and the underlying tin compound is heated and further decomposed to produce the desired tin oxide thin film.
REFERENCES:
patent: 4370028 (1983-01-01), Bernhardt
patent: 4706493 (1987-11-01), Chang
Chang et al., IEEE Solid-State Sensors Workshop Technical Digest (1986).
Chang Shih-Chia
Hicks David B.
Micheli Adolph L.
Bueker Richard
Fekete Douglas D.
General Motors Corporation
LandOfFree
Method for forming patterned tin oxide thin film element does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for forming patterned tin oxide thin film element, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming patterned tin oxide thin film element will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-929159