Method for forming pattern on steel substrate by reactive ion et

Details Method for forming pattern on steel substrate by reactive ion et Method for forming pattern on steel substrate by reactive ion et

1997-08-13

1999-04-06

Powell, William

Etching a substrate: processes

Gas phase etching of substrate

Etching inorganic substrate

216 75, B44C 122

Patent

active

058913513

ABSTRACT:
A method for forming a pattern on a surface of a steel substrate includes the formation of a patterned mask on the surface of the steel substrate. The entire surface having the patterned mask is etched by reactive ion etching such the a pattern is formed on the surface of the steel substrate. The reactive ion etching is brought about by a plasma which is produced in an atmosphere of a chlorine-containing compound, under pressure of 1-100 mTorr, and with a radio frequency power of 100-600 W.

REFERENCES:
patent: 5348616 (1994-09-01), Hartman et al.
patent: 5735896 (1998-04-01), Amon et al.

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