Method for forming pattern of organic insulating film

Details Method for forming pattern of organic insulating film Method for forming pattern of organic insulating film

2007-06-05

2007-06-05

Lee, Hsien-Ming (Department: 2823)

Semiconductor device manufacturing: process

Making device or circuit responsive to nonelectrical signal

Responsive to electromagnetic radiation

C438S099000, C438S022000

Reexamination Certificate

active

11195694

ABSTRACT:
A method for forming a pattern of an organic insulating film by forming an electrode on a substrate, coating an imprintable composition thereon to form an organic insulating film, pressurizing and curing the organic insulating film using a patterned mold to transfer a pattern of the mold to the organic insulating film, and etching a portion of the organic insulating film remaining on the electrode. Since a pattern of an organic insulating film can be formed by simple molding without the use of a photoresist, the overall procedure is simplified and eventually an organic thin film transistor with high charge carrier mobility can be fabricated by all wet processes.

REFERENCES:
patent: 2003/0228718 (2003-12-01), Murti et al.
patent: 2006/0006380 (2006-01-01), Shin et al.
S. Chou et al., Nanoprint lithography, J.Vac. Sci. Technol. B, Nov./Dec. 1996, pp. 4129-4133, vol. 14, No. 6.
CH. Pannemann et al., Nanometer scale organic thin film transistors with Pentacene, Microelectric Engineering 67-68, 2003, pp. 845-852.

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