Method for forming pattern and method for fabricating LCD...

Details Method for forming pattern and method for fabricating LCD... Method for forming pattern and method for fabricating LCD...

2011-03-01

2011-03-01

McPherson, John A. (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Screen other than for cathode-ray tube

C430S323000, C430S329000

Reexamination Certificate

active

07897305

ABSTRACT:
A method for forming a pattern and a method for fabricating an LCD device using the same is disclosed, wherein a photoresist layer is removed from a substrate without using a photoresist stripper, so that the pattern is formed with a low fabrication costs. The method comprising sequentially forming a pattern material layer, a transformed material layer and a photoresist layer on a substrate; patterning the photoresist layer by exposure and development using a mask; selectively etching the transformed material layer and the pattern material layer by using the patterned photoresist layer as a mask; and removing the transformed material layer and the patterned photoresist layer in a lift-off method by applying light.

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Computer-generated translation of JP 2003-303789 (Oct. 2003).
Horibe et al., “Acrylic-Type Resist Removal Using 532nm Laser Pulse”, Journal of the Electrochemical Society, 2006, vol. 153, No. 7, p. G609-G612.

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