Method for forming pattern

Details Method for forming pattern Method for forming pattern

1997-03-03

1999-06-08

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Luminescent imaging

430290, 430311, G03F 700

Patent

active

059103906

ABSTRACT:
A method for forming a resin pattern which includes selectively polymerizing a photopolymerizable resin utilizing a light radiated from a photosensitive substance to form a desired resin pattern. A photosensitive substance layer is formed in a desired pattern on a substrate (or in a substrate when it is light permeable). The photosensitive substance absorbs an irradiation light and radiates a light of a longer wavelength than that of the irradiation light. A photopolymerizable resin layer formed on the substrate is not activated by the irradiation light but is activated by the light radiated from the photosensitive substance. The photopolymerizable resin layer is irradiated with an irradiation light capable of exciting the photosensitive substance and the photo-polymerizable resin is polymerized in the pattern of the photosensitive substance layer with the light radiated from the photosensitive substance.

REFERENCES:
patent: 2441010 (1948-05-01), Dobbins
patent: 4379833 (1983-04-01), Canavello et al.
patent: 4735877 (1988-04-01), Kato et al.
patent: 5532104 (1996-07-01), Goto

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