Coating processes – Direct application of electrical – magnetic – wave – or... – Ion plating or implantation
Reexamination Certificate
2008-01-22
2008-01-22
Padgett, Marianne (Department: 1762)
Coating processes
Direct application of electrical, magnetic, wave, or...
Ion plating or implantation
C427S528000, C427S529000, C427S523000, C427S249100, C427S249700, C427S249900, C427S058000
Reexamination Certificate
active
07320815
ABSTRACT:
A method for forming an oriented film is provided for forming an oriented film on a base material by irradiating the surface of the base material where the oriented film will be formed with an ion beam comprising nitrogen ions from a direction inclined at a prescribed angle θawith respect to the direction perpendicular to the surface, while evaporating carbon from an evaporation source. The prescribed angle, θa, is preferably 45-89°. The accelerating voltage of the ion beam comprising nitrogen ions is preferably 100-500 V. The electric current of the ion beam comprising nitrogen ions is preferably 10-500 mA.
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Endo Yukihiro
Ota Hidenobu
Harness & Dickey & Pierce P.L.C.
Padgett Marianne
Seiko Epson Corporation
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