Method for forming micropatterns

Details Method for forming micropatterns Method for forming micropatterns

2007-05-29

2007-05-29

Chea, Thorl (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Micrography, process, composition, or product other than...

C430S320000, C430S321000, C430S945000, C369S100000, C369S284000, C346S076100

Reexamination Certificate

active

11054244

ABSTRACT:
A method for forming micropatterns includes forming a thin film consisting of a single layer or of plural layers on a substrate, irradiating an energy beam to the thin film to elevate the temperature of a region to a predetermined temperature or higher to thereby modify the region of the thin film, and patterning the thin film at least in such a manner to leave over the modified region.

REFERENCES:
patent: 4394661 (1983-07-01), Peeters
patent: 4729940 (1988-03-01), Nee et al.
patent: 4797316 (1989-01-01), Hecq et al.
patent: 6872511 (2000-03-01), Hirokane et al.
patent: 3-63947 (1991-03-01), None

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