Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
Reexamination Certificate
2005-07-07
2010-06-15
Pham, Thanh V (Department: 2894)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Responsive to electromagnetic radiation
C438S029000, C438S039000, C438S060000, C438S075000, C257SE27135, C257SE31121
Reexamination Certificate
active
07736939
ABSTRACT:
A method for forming microlenses of different curvatures is described, wherein a substrate having at least a first and a second areas different in height is provided. A transparent photosensitive layer having a planar surface is formed on the substrate and then patterned into at least two islands of different thicknesses respectively over the first area and the second area. The at least two islands are heated and softened to form at least two microlenses of different curvatures respectively over the first area and the second area, wherein the higher an area is, the smaller the curvature of the corresponding microlens is.
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Lin Chia-Huei
Wu Hsin-Ping
Pham Thanh V
Shih Chun-Ming
United Microelectronics Corp.
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