Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Reexamination Certificate
2007-04-24
2007-04-24
Padgett, Marianne (Department: 1762)
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
C427S558000, C427S559000, C427S230000, C427S226000, C427S337000, C427S377000
Reexamination Certificate
active
10642271
ABSTRACT:
According to the present invention, there is provided a method for forming a metal oxide film comprising, when a metal oxide film is formed by conducting a thermal treatment on a coating film containing an organic metal compound formed on an inner wall of a tube, performing an ultraviolet irradiation treatment or an ozone treatment on the coating film prior to or simultaneously with the thermal treatment.
REFERENCES:
patent: 3809944 (1974-05-01), Jongerius et al.
patent: 4544997 (1985-10-01), Seuter et al.
patent: 4911953 (1990-03-01), Hosonuma et al.
patent: 4988661 (1991-01-01), Arai et al.
patent: 5260241 (1993-11-01), Addiego et al.
patent: 5935638 (1999-08-01), Chandra et al.
patent: 5962079 (1999-10-01), Koberstein et al.
patent: 5995696 (1999-11-01), Miyagi et al.
patent: 6337032 (2002-01-01), Chivukula et al.
patent: 6376691 (2002-04-01), Celinska et al.
patent: 6399145 (2002-06-01), Jerebic et al.
patent: 6576302 (2003-06-01), Yamaguchi et al.
patent: 6893677 (2005-05-01), Yamada et al.
patent: 6932664 (2005-08-01), Yamada et al.
patent: 1 108 468 (2001-06-01), None
patent: 59-13605 (1984-01-01), None
patent: 7-89720 (1995-04-01), None
“Laser Micro-Fabrication of Waveguide Devices”, IBM Technical Disclosure Bulletin, vol. 31, #11, Apr. 1, 1989, pp. 150-152.
Awamoto Kenji
Ishimoto Manabu
Nakazawa Akira
Shinoda Tsutae
Tokai Akira
Padgett Marianne
Westerman, Hattori, Daniels & Adrian , LLP.
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