Method for forming magneto-resistive memory cells with shape...

Semiconductor device manufacturing: process – Having magnetic or ferroelectric component

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S421000, C365S158000, C365S173000, C365S171000, C365S066000

Reexamination Certificate

active

11148396

ABSTRACT:
A magneto-resistive memory comprising magneto-resistive memory cells is disclosed, comprising a pinned magnetic layer and a free magnetic layer. The two magnetic layers are formed having widened regions at the ends of the layers. As such, the shape made out by the magneto-resisitve memory, from a top-view perspective, is wide at the ends and narrower at the mid-, forming an I shape in one preferred embodiment. The end portions of the free magnetic layer are allowed to magnetically couple to the end portions of the pinned magnetic layer such that magnetic coupling is shifted to these widened regions and coupling in the mid-portion between the widened regions is minimized. Thus, the influence of the pinned magnetic layer on the magnetization orientation of the mid-portion of the free magnetic layer is substantially eliminated, allowing for increased predictability in switching behavior and increased write selectivity of memory cells.

REFERENCES:
patent: 3381171 (1968-04-01), Kienast
patent: 4731757 (1988-03-01), Daughton et al.
patent: 4780848 (1988-10-01), Daughton et al.
patent: 4897288 (1990-01-01), Jenson
patent: 5496759 (1996-03-01), Yue et al.
patent: 5569617 (1996-10-01), Yeh et al.
patent: 5734605 (1998-03-01), Zhu et al.
patent: 5828598 (1998-10-01), Chen et al.
patent: 5841692 (1998-11-01), Gallagher et al.
patent: 5966012 (1999-10-01), Parkin
patent: 6028786 (2000-02-01), Nishimura
patent: 6166948 (2000-12-01), Parkin et al.
patent: 6172904 (2001-01-01), Anthony et al.
patent: 6205053 (2001-03-01), Anthony
patent: 6381171 (2002-04-01), Inomata et al.
patent: 6487110 (2002-11-01), Nishimura et al.
patent: 6555858 (2003-04-01), Jones et al.
patent: 6605836 (2003-08-01), Kishi et al.
patent: 6646910 (2003-11-01), Bloomquist et al.
patent: 6689622 (2004-02-01), Drewes
patent: 6717194 (2004-04-01), Liu et al.
patent: 6765823 (2004-07-01), Zhu et al.
patent: 6872997 (2005-03-01), Liu et al.
patent: 6906950 (2005-06-01), Zhu et al.
patent: 7029923 (2006-04-01), Liu et al.
Dimitrov at al., “Enhanced magnetic stability in spin valves with synthetic antiferromagnet”Journal of Applied Physics87(9):6427-6429 (May 2000).
Leal and Kryder, “Spin Valves biased by Co/Ru/Co Synthetic antiferromagnets”Journal of Applied Physics83(7):3720-3723 (Apr. 1998).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for forming magneto-resistive memory cells with shape... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming magneto-resistive memory cells with shape..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming magneto-resistive memory cells with shape... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3787162

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.