Method for forming low surface energy coating

Details Method for forming low surface energy coating Method for forming low surface energy coating

1998-03-18

2000-04-04

Rodee, Christopher D.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Process of making radiation-sensitive product

430 66, 430 67, 427387, 4273977, G03G 5147

Patent

active

06045962&

ABSTRACT:
A method for forming a low surface energy coating for electrophotographic photosensitive body substrates does not require performing a physical surface reforming treatment such as corona discharge, plasma treatment, and the like. The process comprises: forming on the substrate at least one polysiloxane coating material, (B), that has a water contact angle greater than the water contact angle of the substrate; and thereafter forming an outermost surface coating material, (A), on top of coating material (B). The water contact angle of coating material (B) is smaller than the water contact angle of coating material (A). Coating material (A) comprises finely divided silica and a resin of the formula RSiO.sub.3/2, wherein not less than 1 mol % and not more than 80 mol % of the R groups are fluorohydrocarbon groups of 3 to 12 carbon atoms.

REFERENCES:
patent: 3986997 (1976-10-01), Clark
patent: 4335755 (1982-06-01), Sadler et al.
patent: 4439509 (1984-03-01), Schank
patent: 4997684 (1991-03-01), Franz et al.
patent: 5731117 (1998-03-01), Ferrar et al.

Affiliated with

Also associated with

Rating

Method for forming low surface energy coating does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming low surface energy coating, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming low surface energy coating will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-363562