Method for forming light absorbing pattern using photoresist com

Details Method for forming light absorbing pattern using photoresist com Method for forming light absorbing pattern using photoresist com

1988-01-14

1989-08-15

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Producing cathode-ray tube or element thereof

With light-absorbing matrix on faceplate

430 23, 430 28, 430175, 430194, 430197, G03C 500, H01J 920

Patent

active

048574287

ABSTRACT:
A photoresist film containing a phosphate of a formalin condensate of diazodiphenylamine, 2.5-bis (4'-azide-2'- sulphobenzilidene) cyclopentanone Na, polyvinylalcohol, and polyvinylpyrrolidone is formed on the inner surface of a faceplate. The photoresist film is hardened by light exposure using a point or linear light source, which is essentially a circular light source, via a shadow mask having a large number of apertures. A light absorbing film is formed on this photoresist film. Then the hardened photoresist film and the light absorbing film on top of it are removed using a peeling agent.

REFERENCES:
patent: 3917794 (1975-11-01), Akagi et al.
patent: 4491629 (1985-01-01), Koike et al.
patent: 4596755 (1986-06-01), Koike et al.
Derwent Abstract of Japanese Published Patent 83-057094-B, 12/1983.
English Translation of Japanese Kokai Publication #60-203,933, published 10/15/85, (Isozato, Koike & Watanabe).
English Translation of Japanes Kokai Publication #58-57094, published 12/19/83, (Kobayashi, Nonogaki & Hatano).

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