Method for forming improved H.sub.2 -permselective oxide membran

Details Method for forming improved H.sub.2 -permselective oxide membran Method for forming improved H.sub.2 -permselective oxide membran

1994-06-30

1996-04-02

Bell, Janyce

Coating processes

Heat decomposition of applied coating or base material

Coating decomposed to form carbide or coating carbonized

427226, 427244, 427245, 4274192, 4274197, B05D 302, B05D 5/00

Patent

active

055038735

ABSTRACT:
A method of forming inorganic membranes which are highly selective to permeation of hydrogen by temporarily forming a carbon barrier in the pores of a porous substrate, followed by chemical deposition of SiO.sub.2, B.sub.2 O.sub.3, TiO.sub.2, Al.sub.2 O.sub.3 and mixtures thereof in the pores, followed by removal of the carbon barrier. It has been demonstrated that the permeation selective layers thusly formed by this invention have a five fold increase in permeance over such layers made by a similar method but without forming a temporary carbon barrier in the pores of the porous substrate, and removal of the carbon-barrier after establishment of the oxide membrane. Some suitable porous substrate are Vycor.TM. glass or Al.sub.2 O.sub.3.

REFERENCES:
patent: 4640901 (1987-02-01), Lee et al.
patent: 4738874 (1988-04-01), Berardo et al.
patent: 4902307 (1990-02-01), Gavalas et al.
patent: 5130166 (1992-07-01), Spencer

Affiliated with

Also associated with

Rating

Method for forming improved H.sub.2 -permselective oxide membran does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming improved H.sub.2 -permselective oxide membran, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming improved H.sub.2 -permselective oxide membran will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2014995