Method for forming images by irradiation of electron rays and re

Details Method for forming images by irradiation of electron rays and re Method for forming images by irradiation of electron rays and re

1976-03-18

1977-09-27

Newsome, John H.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

96 351, 96 362, 96115R, 20415922, 427 44, 427273, B05D 306

Patent

active

040512711

ABSTRACT:
Syndiotactic poly(methyl methacrylate) obtained by radical polymerization mixed with isotactic poly(methyl methacrylate) obtained by anionic polymerization so that the ratio by weight of the syndiotactic component to the isotactic component is from 2:8 to 8:2 and the mixture is dissolved homogeneously in a non-polar solvent such as benzene or toluene. The resist composition thus obtained is applied onto a substrate to form a photosensitive element which is then exposed to electron rays to cause depolymerization of the polymer in the exposed areas and developed with an organic solvent to form an image which is excellent in contrast and resolving power and devoid of pinholes.

REFERENCES:
patent: 3779806 (1973-12-01), Gipstein et al.
patent: 3934057 (1976-01-01), Moreau et al.

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