Method for forming high superconducting T.sub.c niobium nitride

Details Method for forming high superconducting T.sub.c niobium nitride Method for forming high superconducting T.sub.c niobium nitride

1983-07-12

1984-01-17

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192S, 204192R, C23C 1500

Patent

active

044262680

ABSTRACT:
A method of forming a high T.sub.c niobium nitride (NbN) film on a substr at ambient substrate temperature. The method includes the step of reactively sputtering NbN onto the substrate in an argon-nitrogen atmosphere with controlled amounts of methane added to the argon-nitrogen gas mixture.

REFERENCES:
patent: 3988178 (1976-10-01), Dahlgren
patent: 4220959 (1980-09-01), Kroger
patent: 4279969 (1981-07-01), Francavilla
patent: 4299679 (1981-11-01), Suzuki
patent: 4299861 (1981-11-01), Dietrich et al.
Wolf et al. J. Vac. Sci. Tech. 17 (1980), pp. 411-414.
Gavaler et al. Appl Phys. Lett. 19 (1971), pp. 305-307.
Keskas et al. Jap. J. Appl. Phys. 10 (1971), pp. 370-374.
Kosaka et al. Jap. J. App. Phys. 21 (1982) Supp. 21, pp. 319-324.
Aubert et al. Thin Solid Films 96 (1982), pp. 191-198.
Akune Jap. J. Appl. Phys. 21 (1982), pp. 772-775.

Affiliated with

Also associated with

Rating

Method for forming high superconducting T.sub.c niobium nitride does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming high superconducting T.sub.c niobium nitride , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming high superconducting T.sub.c niobium nitride will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-699644