Coating processes – Foraminous product produced – Microporous coating
Patent
1994-04-01
1995-09-26
Beck, Shrive
Coating processes
Foraminous product produced
Microporous coating
427243, 4272481, 4272553, 95 55, 96 10, 96 12, C23C 1608, C23C 1640, B01D 6700, B01D 7102
Patent
active
054532981
ABSTRACT:
Methods of forming permselective oxide membranes that are highly selective to permeation of hydrogen by chemical deposition of reactants in the pore of porous tubes, such as Vycor.TM. glass or Al.sub.2 O.sub.3 tubes. The porous tubes have pores extending through the tube wall. The process involves forming a stream containing a first reactant of the formula RX.sub.n, wherein R is silicon, titanium, boron or aluminum, X is chlorine, bromine or iodine, and n is a number which is equal to the valence of R; and forming another stream containing water vapor as the second reactant. Both of the reactant streams are passed along either the outside or the inside surface of a porous tube and the streams react in the pores of the porous tube to form a nonporous layer of R-oxide in the pores. The membranes are formed by the hydrolysis of the respective halides. In another embodiment, the first reactant stream contains a first reactant having the formula SiH.sub.n Cl.sub.4-n where n is 1, 2 or 3; and the second reactant stream contains water vapor and oxygen. In still another embodiment the first reactant stream containing a first reactant selected from the group consisting of Cl.sub.3 SiOSiCl.sub.3, Cl.sub.3 SiOSiCl.sub.2 OSiCl.sub.3, and mixtures thereof and the second reactant stream contains water vapor. In still another embodiment, membrane formation is carried out by an alternating flow deposition method. This involves a sequence of cycles, each cycle comprising introduction of the halide-containing stream and allowance of a specific time for reaction followed by purge and flow of the water vapor containing stream for a specific length of time. In all embodiments the nonporous layers formed are selectively permeable to hydrogen.
REFERENCES:
patent: 3957559 (1976-05-01), Hoffman, Jr.
patent: 4197148 (1980-04-01), Shinomura
patent: 4483694 (1984-11-01), Takamura et al.
patent: 4619866 (1986-10-01), Smith et al.
patent: 4719093 (1988-01-01), Falk et al.
patent: 4877651 (1989-10-01), Dory
patent: 4902307 (1990-02-01), Gavalas et al.
patent: 5212050 (1993-05-01), Mier et al.
Bunshah, R. F., Deposition Technologies For Films and Coatings, Noyes Publications, pp. 7-8, 1982.
Gavalas George R.
Kim Soo-jin
Nam Suk Woo
Tsapatsis Michael
Beck Shrive
California Institute of Technology
Chen Bret
Logan F. Eugene
LandOfFree
Method for forming H2-permselective oxide membranes does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for forming H2-permselective oxide membranes, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming H2-permselective oxide membranes will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1551138