Method for forming film pattern and method for manufacturing...

Coating processes – Nonuniform coating

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C427S066000, C427S421100

Reexamination Certificate

active

07897211

ABSTRACT:
A method for forming a film pattern made of a high-performance material by arranging a functional fluid on a base substrate and drying the functional fluid, the functional fluid being the high-performance material dissolved or dispersed in a solvent is provided. The method includes: forming liquid reception portions in an effective area and a non-effective area of the base substrate on which the film pattern is to be formed, the non-effective area surrounding the effective area; arranging the functional fluid in the liquid reception portions formed in the effective area; and arranging the functional fluid or the solvent in the liquid reception portions formed in the non-effective area, wherein, in the non-effective area, larger amounts of the solvent are arranged in the liquid reception portions in areas that are more distant from a center of the effective area.

REFERENCES:
patent: 2001/0001050 (2001-05-01), Miyashita et al.
patent: 2002/0064966 (2002-05-01), Seki et al.
patent: 2002/0105080 (2002-08-01), Speakman
patent: 2003/0030766 (2003-02-01), Kiguchi et al.
patent: 2005/0161665 (2005-07-01), Winters et al.
patent: 2005/0212841 (2005-09-01), Okano
patent: 11-054270 (1999-02-01), None
patent: 2001-291587 (2001-10-01), None
patent: 2002-222695 (2002-08-01), None
patent: 2003-245582 (2003-09-01), None
patent: 2004-031360 (2004-01-01), None
patent: 2004-127897 (2004-04-01), None
patent: 2004-311206 (2004-11-01), None
patent: 2004-330136 (2004-11-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for forming film pattern and method for manufacturing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming film pattern and method for manufacturing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming film pattern and method for manufacturing... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2760268

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.