Method for forming electrical connection to the inner layers of

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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427 98, 205126, 20412935, 20412975, 204DIG7, B05D 512, C25D 534, C25F 314

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active

054727359

ABSTRACT:
The present invention relates to a method for selectively electroetching a metal from an electrical device having the steps of: immersing the electrical device in an etching solution; immersing a cathode in the etching solution; applying an etching potential to a preselected area of the metal; and maintaining a passivation potential at the metal to remain unetched. The metal to remain unetched is not electrically connected to the preselected area and the passivation potential does not equal the etching potential.
The present invention further relates to a method of forming an electrical connection to the inner layers of a multilayer circuit board having a copper foil surface layer and copper containing inner layers.

REFERENCES:
patent: 3562040 (1971-02-01), Garies
patent: 3701698 (1972-10-01), Forestek
patent: 3742597 (1973-07-01), Davis
patent: 3785945 (1974-01-01), MacArthur
patent: 3873429 (1975-03-01), Brown
patent: 4022619 (1977-05-01), Pagliaro et al.
patent: 4078980 (1978-03-01), Harris et al.
patent: 4135988 (1979-01-01), Dugan et al.
patent: 4217182 (1980-08-01), Cross
patent: 4303482 (1981-12-01), Buhne et al.
patent: 4391841 (1983-07-01), Zeblisky
patent: 4425380 (1984-01-01), Nuzzi et al.
patent: 4521262 (1985-06-01), Pellegrino
patent: 4588471 (1986-05-01), Griffith et al.
patent: 4765865 (1988-08-01), Gealer et al.
patent: 4783237 (1988-11-01), Aine et al.
patent: 5167778 (1992-12-01), Kaneko et al.
patent: 5252195 (1993-10-01), Kobayashi et al.
patent: 5374338 (1994-12-01), Boyko et al.

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