Method for forming deposition film

Details Method for forming deposition film Method for forming deposition film

1985-10-28

1986-12-02

Newsome, John H.

Coating processes

Electrical product produced

Welding electrode

427 541, 427 86, 427 93, 427 94, C23C 1100

Patent

active

046264493

ABSTRACT:
A method for forming a deposition film by introducing a starting gas for formation of a deposition film into a reaction chamber housing a substrate therein and forming a deposition film on the substrate by irradiation with light comprises performing deposition by using a monochromatic light and a continuous polychromatic light in combination and projecting the lights on the substrate on which the deposition film is to be formed.

REFERENCES:
patent: 3661637 (1972-05-01), Sirtl
patent: 4340617 (1982-07-01), Deutsch et al.
patent: 4476154 (1984-10-01), Iesaka et al.
patent: 4568565 (1986-02-01), Gupta et al.
patent: 4581249 (1986-04-01), Kamiya

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