Method for forming deposited films of group II-VI compounds

Details Method for forming deposited films of group II-VI compounds Method for forming deposited films of group II-VI compounds

1989-01-17

1989-09-26

Childs, Sadie

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

4271261, 4271262, 427255, 4272553, C23C 1630, C23C 1640

Patent

active

048699314

ABSTRACT:
A method for forming a deposited film, which comprises introducing a gaseous starting material containing an element in the Group II of the periodic table, a starting material containing an element in the Group VI of the periodic table which are gasifiable for formation of a deposited film, and a gaseous halogenic oxidizing agent having the property of oxidation action on said starting materials into a reaction space to effect contact therebetween to thereby chemically form a plural number of precursors containing precursors under excited state, and forming a deposited film on a substrate existing in a film-forming space by the use of at least one precursor of said precursors as the feeding source for the constituent element of the deposited film.

REFERENCES:
patent: Re31708 (1984-10-01), Gordon
patent: 2552626 (1951-05-01), Fisher et al.
patent: 3083550 (1963-04-01), Auerbach
patent: 3188230 (1965-06-01), Bakish et al.
patent: 3203827 (1965-08-01), Hill
patent: 3218204 (1965-11-01), Ruehrwein
patent: 3224912 (1965-12-01), Ruehrwein
patent: 3306768 (1967-02-01), Peterson
patent: 3466191 (1969-09-01), Stinchfield et al.
patent: 3506556 (1970-04-01), Illery et al.
patent: 3655429 (1972-04-01), Deklerk
patent: 3664866 (1972-05-01), Manasevit
patent: 3850679 (1974-11-01), Sopko et al.
patent: 3870558 (1975-03-01), Shimizu et al.
patent: 3984587 (1976-10-01), Lipp
patent: 4058430 (1977-11-01), Suntola et al.
patent: 4146657 (1979-03-01), Gordon
patent: 4180596 (1979-12-01), Crowder et al.
patent: 4206252 (1980-06-01), Gordon
patent: 4239811 (1980-12-01), Kemlage
patent: 4328261 (1982-05-01), Heinecke et al.
patent: 4357179 (1982-11-01), Adams et al.
patent: 4359490 (1982-11-01), Lehrer
patent: 4402762 (1983-09-01), John et al.
patent: 4416217 (1983-11-01), Nakamura et al.
patent: 4448801 (1984-05-01), Fukuda et al.
patent: 4515107 (1985-05-01), Fournier et al.
patent: 4522663 (1985-06-01), Ovshinsky et al.
patent: 4526809 (1985-07-01), Hall et al.
patent: 4529679 (1985-07-01), Ogawa et al.
patent: 4554180 (1985-11-01), Hirooka
patent: 4595601 (1986-06-01), Horioka et al.
patent: 4615905 (1986-10-01), Ovshinsky
patent: 4637938 (1987-01-01), Lee et al.
patent: 4650539 (1987-03-01), Irvine et al.
patent: 4652463 (1987-03-01), Peters

Affiliated with

Also associated with

Rating

Method for forming deposited films of group II-VI compounds does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming deposited films of group II-VI compounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming deposited films of group II-VI compounds will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-186666