Method for forming deposited film

Details Method for forming deposited film Method for forming deposited film

1986-12-23

1989-03-14

Childs, Sadie

Coating processes

Electrical product produced

Fluorescent or phosphorescent base coating

427 70, 427255, 4272552, 4272553, 4272557, B05D 56, B05D 512

Patent

active

048123285

ABSTRACT:
A method for forming a deposited film by introducing a gaseous starting material for formation of a deposited film and a gaseous halogenic oxidizing agent having the property of oxidation action on said starting material separately from each other into a reaction space to form a deposited film according to a chemical reaction, which comprises activating previously a gaseous substance (B) for formation of a band gap controller in an activation space to form an activated species and introducing said activated species into the reaction space to form a deposited film controlled in band gap on a substrate existing in the film forming space.

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