Coating processes – Electrical product produced – Fluorescent or phosphorescent base coating
Patent
1986-10-22
1989-04-04
Childs, Sadie
Coating processes
Electrical product produced
Fluorescent or phosphorescent base coating
427 70, 427255, 4272551, 4272552, 437225, B05D 506, B05D 512, C23C 1600
Patent
active
048185647
ABSTRACT:
A method for forming a deposited film comprises introducing a gaseous starting material for formation of a deposited film and a gaseous halogenic oxidizing agent having the property of oxidation action for said starting material into a reaction space to effect chemical contact therebetween to thereby form a plural number of precursors containing precursors under excited state, and forming a deposited film on a substrate existing in the film forming space with the use of at least one precursor of these precursors as the feeding source for the constituent element of the deposited film.
REFERENCES:
patent: Re31708 (1984-10-01), Gordon
patent: 3473978 (1969-10-01), Jackson et al.
patent: 3888705 (1975-06-01), Fletcher et al.
patent: 4146657 (1979-03-01), Gordon
patent: 4239811 (1980-12-01), Kemlage
patent: 4357179 (1982-11-01), Adams et al.
patent: 4402762 (1983-09-01), John et al.
patent: 4421592 (1983-12-01), Shuskus et al.
patent: 4448801 (1984-05-01), Fukuda et al.
patent: 4462847 (1984-07-01), Thompson et al.
patent: 4504518 (1985-03-01), Dushinsky et al.
patent: 4522663 (1985-06-01), Dushinsky et al.
patent: 4554180 (1985-11-01), Hirooka
patent: 4615905 (1986-10-01), Dushinsky et al.
patent: 4624736 (1986-11-01), Gee et al.
patent: 4624906 (1986-11-01), Kawamura et al.
patent: 4637938 (1987-01-01), Lee et al.
patent: 4645689 (1987-02-01), Cox
patent: 4652463 (1987-03-01), Peters
patent: 4657777 (1987-04-01), Hirooka
patent: 4689093 (1987-08-01), Ishihara et al.
Ohnishi et al., Proceedings, 6th E.C. Photovoltaic Solar Energy Conference, London, Apr. 15-19, 1985.
Sakai et al., Proceedings, 6th E.C. Photovoltaic Solar Energy Conference, London, Apr. 15-19, 1985.
Brodsky, et al., 22 IBM Technical Disclosure Bulletin 3391 (Jan. 1980).
Inoue, Appl. Phys. Lett. 43(8), 15 Oct. 83, p. 774.
Hanna Jun-ichi
Ishihara Shunichi
Shimizu Isamu
Canon Kabushiki Kaisha
Childs Sadie
LandOfFree
Method for forming deposited film does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for forming deposited film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming deposited film will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-179255