Method for forming deflection grating

Details Method for forming deflection grating Method for forming deflection grating

1996-09-26

1998-09-29

Gupta, Yogendra N.

Etching a substrate: processes

Forming or treating optical article

216 49, 216 51, 216 75, 430 64, 430 72, 430321, H01L 2100

Patent

active

058142371

ABSTRACT:
A method for forming a deflection grating is disclosed, includes the steps of: sequentially forming a dielectric layer and photoresist layer on a compound semiconductor substrate, and patterning the photoresist layer through optical holography to expose the dielectric layer; removing a portion of the dielectric layer on which the patterned photoresist layer is not formed, through RIE using the patterned photoresist layer as a mask; anisotropically etching a portion of the semiconductor substrate on which the dielectric layer is not formed, through RIE using the dielectric layer as a mask, to form a deflection grating; and removing the dielectric layer.

REFERENCES:
patent: 4927785 (1990-05-01), Theetan et al.

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