Etching a substrate: processes – Forming or treating optical article
Patent
1996-03-11
1998-01-27
Chapman, Mark
Etching a substrate: processes
Forming or treating optical article
216 26, 216 38, 216 39, 257432, 257436, 257440, 257443, H01L 2714
Patent
active
057118906
ABSTRACT:
A method of making an imager includes the following steps: providing a semiconductor substrate having a top surface; providing a plurality of spaced image pixels h the substrate, thereby forming a semiconductor portion; and depositing a first transparent substantially inorganic support layer over the semiconductor portion. The method further includes the following steps: making the inorganic support layer optically planar by chemical mechanical polishing, thereby forming an optically flat top surface; forming a plurality of depressions in the optically flat top surface; uniformly depositing a substantially inorganic lens material on the optically flat top surface, entirely filling the depressions; and making the substantially inorganic lens material optically planar by chemical mechanical polishing, thereby forming an optically planar lens surface.
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Hawkins Gilbert Alan
Mehra Madhav
Parks Christopher
Chapman Mark
Eastman Kodak Company
Owens Raymond L.
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