Method for forming continuous oxide superconducting layer having

Details Method for forming continuous oxide superconducting layer having Method for forming continuous oxide superconducting layer having

1993-05-18

1995-05-23

Dang, Thi

Superconductor technology: apparatus, material, process

Processes of producing or treating high temperature...

Producing josephson junction, per se

505728, 505410, 216 3, H01L 2100

Patent

active

054182131

ABSTRACT:
A method for forming an oxide superconductor thin film having different thickness portions, in a process for manufacturing a superconductor device, includes the step of forming an oxide superconductor thin film having a uniform thickness on a substrates. A portion of the oxide superconductor thin film is etch-removed so that the oxide superconductor thin film has a thin thickness portion. Preferably, before the etching, the oxide superconductor thin film is coated with a metal layer, and the oxide superconductor thin film and the metal layer are etched together by means of a physical dry etching process.

REFERENCES:
patent: 5041188 (1991-08-01), Myrosznyk et al.
patent: 5047390 (1991-09-01), Higashino et al.
H. Tsuge et al. "Microfabrication processes for high-Tc superconducting films", 1989 Proceedings of the 39th Electronic Components Conference, vol. 39, May 28, 1989, pp. 7-12.
M. G. Blamire, et al., "Fabrication and properties of superconducting device structures in YBa.sub.2 Cu.sub.3 O.sub.7-x thin films" Journal of Physics D:Applied Physics vol. 20, No. 10, Oct. 14, 1987, pp. 1330-1335.
Fisanick et al, "CW Laser Etching of Ba.sub.2 YCu.sub.3 O.sub.7 Films", American Institute of Physics, pp. 189-196, 1988.

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