Method for forming compressive alpha-tantalum on substrates...

Coating processes – Coating by vapor – gas – or smoke – Metal coating

Reexamination Certificate

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C427S255700, C427S596000, C204S192100

Reexamination Certificate

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06955835

ABSTRACT:
A layer of compressive alpha-tantalum is formed on a substrate by depositing a buffer layer on the substrate and depositing a layer of compressive alpha-tantalum on the buffer layer with lattice matching between the layer of compressive alpha-tantalum and the buffer layer. In some embodiments, the method may include depositing buffers layers comprising titanium, niobium, substantially pure aluminum or aluminum-copper alloy.

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