Method for forming channels of high fluid conductivity in hard a

Wells – Processes – Placing fluid into the formation

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

166280, 166308, E21B 4327

Patent

active

042457025

ABSTRACT:
A fracturing and acidization method for increasing the productivity of relatively hard acid-soluble formations about a perforated well, comprising the steps of producing a formation fracture containing a viscous fluid and propping agent; injecting an acid solution having a viscosity value fifty times less than the contained viscous fluid into the fluid filled fracture, thereby forming etched channels in the fracture walls and displacing the propping agent from such channels; and lowering the fluid pressure in the fracture to allow the walls thereof to become displaced towards a closing position until held open by the propping agent. Channels so formed have a greater width than can be formed by conventional techniques and consequently substantially increase the productivity of such formations.

REFERENCES:
patent: 2664165 (1953-12-01), Bond
patent: 3167124 (1965-01-01), Graham
patent: 3455388 (1969-07-01), Huitt
patent: 3592266 (1971-07-01), Tinsley
patent: 3768564 (1973-10-01), Knox et al.
patent: 3842911 (1974-10-01), Knox et al.
patent: 3918524 (1975-11-01), Broaddus
patent: 3954142 (1976-05-01), Broaddus et al.
patent: 4078609 (1978-03-01), Pavlich

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for forming channels of high fluid conductivity in hard a does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming channels of high fluid conductivity in hard a, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming channels of high fluid conductivity in hard a will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1762437

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.