Method for forming catalytic sites at the surface of a support

Semiconductor device manufacturing: process – Having biomaterial component or integrated with living organism

Reexamination Certificate

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C257SE29167

Reexamination Certificate

active

10494289

ABSTRACT:
A method for forming catalytic sites at the surface of a support, which includes: depositing on the surface a liquid film (3) containing elements (4) of a living matter, capable of moving when subjected to an electric and/or magnetic field and designed to form catalytic traces or alterations at the surface of the substrate; applying an electric and/or magnetic field to the film such that, under the effect of the field, at least some of the living matter elements move and assemble on zones of the substrate surface; and eliminating the liquid film and the living matter at the substrate surface while allowing the traces left by the living element at the substrate surface to subsist so as to constitute the catalytic sites at the locations of the traces.

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patent: 0 607 636 (1994-07-01), None

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