Method for forming black matrix

Details Method for forming black matrix Method for forming black matrix

1999-04-12

2000-08-15

McPherson, John A.

Radiation imagery chemistry: process, composition, or product th

Producing cathode-ray tube or element thereof

With light-absorbing matrix on faceplate

430 28, H01J 2932, G03F 700

Patent

active

061034320

ABSTRACT:
A method for forming a black matrix includes forming a black matrix applying a photoresist forming composition containing a compound represented by the formula (1) on the inner surface of a panel and drying the same to form a photoresist layer; exposing the photoresist layer; applying a black pigment solution for forming a black matrix on the photoresist layer and drying the same to form a black pigment layer; and developing the resultant structure; ##STR1## wherein, X is a halogen atom and l:m:n is 1.0-4.5:70.0-98.0:1.0-20.0. The method for forming a black matrix is a non-etching method, which is a simplified process and is not detrimental to environment. Also, since the black matrix material can be recovered from a developing solution for recycling, it is economical. Also, since the photoresist forming composition of the present invention has a good photosensitivity, a black matrix having an excellent landing margin can be obtained. Also, blackness of the black matrix pattern can be improved by using a Ti-containing black pigment as the black matrix forming composition.

REFERENCES:
patent: 4537851 (1985-08-01), Nonogaki et al.
patent: 5498498 (1996-03-01), Uchikawa et al.
patent: 5626994 (1997-05-01), Takayanagi et al.

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