Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Patent
1996-04-29
1997-06-10
Niebling, John
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
216 24, H01L 21265
Patent
active
056375174
ABSTRACT:
An inventive method for the manufacture of an array of M.times.N thin film actuated mirrors includes the steps of: providing an active matrix; forming a thin film sacrificial layer; depositing an elastic layer; forming an array of M .times.N conduits in the elastic layer; depositing a second thin film, a thin film electrodisplacive, a first thin film layers on top of the elastic layer, successively; patterning the first thin film, the thin film electrodisplacive and the second thin film layers into an array of M.times.N first thin film electrodes, an array of M.times.N thin film electrodisplacive members and an array of M.times.N second thin film electrodes, respectively, thereby forming an array of M.times.N semi-actuated mirror structures; patterning the elastic layer into M number of pseudo elastic members, each of the M number of pseudo elastic members having N number of bridge-shaped portions; forming a thin film protection layer completely covering the semiactuated mirror structures; removing the thin film sacrificial layer; removing the thin film protection layer; and patterning the M number of pseudo elastic members into an array of M.times.N elastic members, thereby forming the array of M.times.N thin film actuated mirrors.
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Daewoo Electronics Co. Ltd.
Lebentritt Michael S.
Niebling John
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