Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element
Reexamination Certificate
2007-10-30
2007-10-30
Pham, Thanhha S. (Department: 2813)
Semiconductor device manufacturing: process
Making device or circuit emissive of nonelectrical signal
Including integrally formed optical element
C438S031000, C438S032000
Reexamination Certificate
active
10884895
ABSTRACT:
Methods are disclosed for forming optoelectronic devices. In one example of such a method, a substrate is provided and a partially conductive bottom mirror formed thereon. An active region is then formed on the bottom mirror, and a top mirror formed on the active region. A gain guide is then formed in the top mirror. Finally, a substantially dielectric isolation layer, as well as a resonant reflector, are formed on the top mirror. The isolation layer is interposed between the resonant reflector and the top mirror, and the isolation layer is formed so as to substantially prevent energy in an evanescent tail of a guided mode associated with the resonant reflector from entering the top mirror.
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Cox James Allen
Morgan Robert A.
Finisar Corporation
Pham Thanhha S.
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