Fishing – trapping – and vermin destroying
Patent
1996-02-23
1997-06-17
Niebling, John
Fishing, trapping, and vermin destroying
437193, 437200, 437241, H01L 2128
Patent
active
056396872
ABSTRACT:
Reflective notching of a photoresist pattern (20), generated over reflective materials on a semiconductor substrate (12), is minimized by using an anti-reflective layer (20) of silicon-rich silicon nitride. The layer of silicon-rich silicon nitride is formed over the reflective materials and a layer of photoresist is then formed over the silicon-rich silicon nitride. The photoresist layer is then photolithographically patterned to form an integrated circuit pattern (20). The silicon-rich silicon nitride layer has an absorptive index of greater than 0.25, which allows it to be used as an anti-reflective layer with photolithographic patterning systems having ultraviolet and deep ultraviolet exposure wavelengths.
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Nguyen Bich-Yen
Ramiah Chandrasekaram
Roman Bernard John
Bilodeau Thomas G.
Cooper Kent J.
Motorola Inc.
Niebling John
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