Method for forming an electrode pattern such as a pattern of inp

Coating processes – Nonuniform coating – Deforming the base or coating or removing a portion of the...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Other Related Categories

427123, 4271262, 427282, 427349, 427 77, B05D 312, B05D 512

Type

Patent

Status

active

Patent number

060746971

Description

ABSTRACT:
An electrode pattern can be formed on a ceramic electronic part by removing part of a conductive film formed on the surface of a sintered ceramic body, by the following steps: 1) forming a conductive film on the surface of the ceramic body; 2) placing a mask on the conductive film, the mask having an opening corresponding to the electrode pattern to be formed, 3) blasting the ceramic body with an abrasive material so as to remove the conductive film in a region corresponding to the opening in the mask, and 4) removing the mask from the conductive film. The mask is reusable for being repeatedly placed on and removed from conductive films on respective ceramic bodies.

REFERENCES:
patent: 4232059 (1980-11-01), Proffitt
patent: 4952420 (1990-08-01), Walters
patent: 5120572 (1992-06-01), Kumar
patent: 5347712 (1994-09-01), Yasuda et al.
patent: 5578974 (1996-11-01), Yang et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method for forming an electrode pattern such as a pattern of inp does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming an electrode pattern such as a pattern of inp, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming an electrode pattern such as a pattern of inp will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2066516

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.