Method for forming a transparent electrode film

Details Method for forming a transparent electrode film Method for forming a transparent electrode film

2007-01-16

2007-01-16

Hassanzadeh, Parviz (Department: 1763)

Etching a substrate: processes

Forming or treating article containing a liquid crystal...

Reexamination Certificate

active

10887221

ABSTRACT:
A method for forming a transparent electrode film is provided. The method includes: forming an insulating film on a substrate material, forming a contact hole in the insulating film, and coating a region where a transparent conductive film is to be formed with a liquid containing a precursor of the transparent conductive film. The liquid coats any unnecessary insulating film formed on the substrate material inside the contact hole when the contact hole is formed. The liquid is a solvent containing fluorine capable of dissolving the unnecessary insulating film. By annealing the liquid to volatilize the components of the unnecessary insulating film dissolved in the precursor substance of the transparent conductive film, the unnecessary insulating film is removed.

REFERENCES:
patent: 09-18601 (1997-07-01), None

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