Method for forming a transparent conductive ITO film

Details Method for forming a transparent conductive ITO film Method for forming a transparent conductive ITO film

1993-10-20

1996-07-23

Fourson, George

Fishing, trapping, and vermin destroying

20419229, C23C 1434, H01L 21265

Patent

active

055389058

ABSTRACT:
A method for forming a transparent conductive film includes the steps of: forming an ITO film on a substrate by sputtering a target including oxygen atoms, indium atoms, and tin atoms under an inert gas atmosphere; patterning the ITO film by selectively removing a prescribed portion of the ITO film using an etching method; and doping the patterned ITO film with oxygen using an ion shower doping method, thereby forming the transparent conductive film from the ITO film.

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